English  |  正體中文  |  简体中文  |  Items with full text/Total items : 2737/2828
Visitors : 3514356      Online Users : 35
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://ir.lib.stu.edu.tw:80/ir/handle/310903100/2905

Title: 以電子束蒸鍍製備多層透明導電膜之研究
Investigation the Transparent Conductive Multilayer Prepared by Electron Beam Evaporation
Authors: 劉智盛
chih-sheng Liu
Contributors: 電腦與通訊系碩士班
程達隆
Keywords: 透明導電膜;三氧化鉬;;穿透率;電阻率
Transparent conductive oxide;MoO3;Ag;conductive;transmittance
Date: 2012
Issue Date: 2012-03-22 15:26:52 (UTC+8)
Publisher: 高雄市:[樹德科技大學電腦與通訊系碩士班]
Abstract: 本實驗是利用電子束蒸鍍(E-Beam)技術在玻璃基板上製備 MoO3/Ag/MoO3 多層結構的透明導電薄膜。在實驗上我們固定了三氧化鉬的錶頭顯示值,其顯示值為0.1 kÅ,固定了三氧化鉬的錶頭顯示值後,開始一系列的改變銀薄膜的錶頭顯示值,顯示值範圍為 0.4 kÅ~1.1 kÅ ,並觀察MoO3/Ag/MoO3多層膜的厚度對透光率及電阻率的影響。在此項研究中,透明導電薄膜的金屬層由錶頭顯示值的 0.4 kÅ 逐步增加至 1.1 kÅ ,其中上下兩層三氧化鉬的錶頭顯示值則控制在0.1 kÅ 。在薄膜成長的過程中發現,當E-Beam 功率增加時,薄膜的緻密性及附著性都會增加,如此可獲得較高的穿透率及較低的片電阻特性。實驗結果顯示,多層透明導電膜在400 nm~700 nm的平均穿透率可達到65%,其片電阻為5.5 Ω/sq。
In this study, silver-based MoO3/Ag/MoO3 transparent conductive oxide was fabricated on glass by e-beam evaporation (E-Beam) technique. In the experiment, the fixed monitor thickness of MoO3 was 0.1 kÅ and the monitor thickness of silver layer was 0.4 kÅ~1.1 kÅ. The investigations of MoO3/Ag/MoO3 multilayer include the conductive and transmittance. Experimental results show that the compact thin-film can be achieved by high power e-beam evaporation. In this experiment, the optimum Ag monitor thickness is 1.0 kÅ with average transmittance of 65% at 400 nm~700 nm and sheet resistance of 5.5 Ω/sq.
Appears in Collections:[電腦與通訊系(所)] 博碩士論文

Files in This Item:

File Description SizeFormat
index.html0KbHTML461View/Open
stu-101-s98637105-1.pdf全文1287KbAdobe PDF1376View/Open
Null.htm國圖21KbHTML507View/Open


All items in STUAIR are protected by copyright, with all rights reserved.

 


無標題文件

著作權政策宣告:

1.

本網站之數位內容為樹德科技大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,惟仍請適度,合理使用本網站之內容,以尊重著作權人之權益。商業上之利用,則請先取得著作權人之授權。
 
2. 本網站之製作,已盡力防止侵害著作權人之權益,如仍發現本網站之數位內容有侵害著作權人權益情事者,請權利人通知本校護人員(clairhsu@stu.edu.tw),維護人員將立即採取移除該數位著作等補救措施。
 
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback